Chemical Process Design and Simulation Aspen plus and aspen HYSYS application

By: Haydary, JumaMaterial type: TextTextPublication details: USA John Wiley 2019Description: 391pISBN: 9781119089117Subject(s): Chemical engineering | Process designDDC classification: 660.2812
Tags from this library: No tags from this library for this title. Log in to add tags.
Star ratings
    Average rating: 0.0 (0 votes)
Holdings
Item type Current library Shelving location Call number Copy number Status Date due Barcode
Book Book Mahatma Gandhi Central Library
CHD 660.2812 H44C (Browse shelf(Opens below)) 1 Available 387783
Book Book Mahatma Gandhi Central Library
660.2812 H44C (Browse shelf(Opens below)) 2 Available 387784

There are no comments on this title.

to post a comment.

Powered by Koha